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Novel Nanotechnology Heals Abscesses Caused by Resistant Staph Bacteria

Researchers at Albert Einstein College of Medicine of Yeshiva University have developed a new approach for treating and healing skin abscesses caused by bacteria resistant to most antibiotics. The study appears in the journal PLoS One.

Abscesses are deep skin infections that often resist antibiotics and may require surgical drainage. For their new treatment strategy, the Einstein scientists developed tiny nanoparticles — smaller than a grain of pollen — that carry nitric oxide (NO), a gas that helps in the body's natural immune response to infection.

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